发明申请
US20110297640A1 METHOD FOR PRODUCING MOLD AND ELECTRODE STRUCTURE USED THEREFOR
审中-公开
用于生产模具和电极结构的方法
- 专利标题: METHOD FOR PRODUCING MOLD AND ELECTRODE STRUCTURE USED THEREFOR
- 专利标题(中): 用于生产模具和电极结构的方法
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申请号: US13201783申请日: 2010-02-16
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公开(公告)号: US20110297640A1公开(公告)日: 2011-12-08
- 发明人: Akinobu Isurugi , Kiyoshi Minoura
- 申请人: Akinobu Isurugi , Kiyoshi Minoura
- 申请人地址: JP Osaka-shi, Osaka
- 专利权人: SHARP KABUSHIKI KAISHA
- 当前专利权人: SHARP KABUSHIKI KAISHA
- 当前专利权人地址: JP Osaka-shi, Osaka
- 优先权: JP2009-034148 20090217
- 国际申请: PCT/JP2010/000937 WO 20100216
- 主分类号: C25F3/00
- IPC分类号: C25F3/00 ; H01L21/306
摘要:
A motheye mold fabrication method of an embodiment of the present invention includes: (a) anodizing a surface of an aluminum film or aluminum base via an electrode that is in contact with the surface, thereby forming a porous alumina layer which has a plurality of very small recessed portions; (b) after step (a), allowing the porous alumina layer to be in contact with an etchant, thereby enlarging the plurality of very small recessed portions of the porous alumina layer; and (c) after step (b), further anodizing the surface via the electrode to grow the plurality of very small recessed portions. In at least one example embodiment, step (b) is performed in such a controlled state that part of the electrode which is in contact with the surface in the etchant would not be exposed to the etchant. Thus, production of a defect due to nonuniform corrosion can be prevented.
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