发明申请
- 专利标题: SEMICONDUCTOR COMPONENT AND METHOD OF MANUFACTURE
- 专利标题(中): 半导体元件及其制造方法
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申请号: US12827980申请日: 2010-06-30
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公开(公告)号: US20110298115A1公开(公告)日: 2011-12-08
- 发明人: Phillip Celaya , Yeu Wen Lee , Weng Onn Low , Virgilio Abalos, JR. , Jamieson Wardall
- 申请人: Phillip Celaya , Yeu Wen Lee , Weng Onn Low , Virgilio Abalos, JR. , Jamieson Wardall
- 优先权: MYPI2010002543 20100602
- 主分类号: H01L23/495
- IPC分类号: H01L23/495 ; H01L23/48 ; H01L21/50
摘要:
A semiconductor component and a method for manufacturing the semiconductor component, wherein the semiconductor component is configured to permit the determination of circuit parameters. A high side FET has a gate terminal coupled to an output terminal of a high side gate drive circuit, a drain terminal coupled for receiving an input voltage, and a source terminal coupled to the drain terminal of a low side FET. The gate terminal of the low side FET is coupled to the output terminal of low side drive circuit and the source terminal of the low side FET is coupled for receiving a source of operating potential. The high side gate drive circuit has a bias terminal coupled for receiving a floating potential where the bias terminal is electrically isolated or decoupled from the commonly connected source and drain terminals of the high side FET and the low side FET, respectively.
公开/授权文献
- US08461670B2 Semiconductor component and method of manufacture 公开/授权日:2013-06-11
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