发明申请
US20110305835A1 SYSTEMS AND METHODS FOR A GAS TREATMENT OF A NUMBER OF SUBSTRATES
审中-公开
用于气体处理多个基板的系统和方法
- 专利标题： SYSTEMS AND METHODS FOR A GAS TREATMENT OF A NUMBER OF SUBSTRATES
- 专利标题（中）： 用于气体处理多个基板的系统和方法
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申请号： US12814936申请日： 2010-06-14
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公开(公告)号： US20110305835A1公开(公告)日： 2011-12-15
- 发明人: Ronald Thomas Bertram, JR. , Chantal Arena , Ed Lindow
- 申请人： Ronald Thomas Bertram, JR. , Chantal Arena , Ed Lindow
- 申请人地址： FR Bernin
- 专利权人： S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES
- 当前专利权人： S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES
- 当前专利权人地址： FR Bernin
- 主分类号： C23C16/458
- IPC分类号： C23C16/458 ; C23C16/44 ; C23C16/00
摘要：
Systems and methods for the gas treatment of one or more substrates include at least two gas injectors in a reaction chamber, one of which may be movable. The systems may also include a substrate support structure for holding one or more substrates disposed within the reaction chamber. The movable gas injector may be disposed between the substrate support structure and another gas injector. The gas injectors may be configured to discharge different process gasses therefrom. The substrate support structure may be rotatable around an axis of rotation.