发明申请
- 专利标题: HEAT DISSIPATING SUBSTRATE AND METHOD OF MANUFACTURING THE SAME
- 专利标题(中): 散热基板及其制造方法
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申请号: US12897936申请日: 2010-10-05
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公开(公告)号: US20110316035A1公开(公告)日: 2011-12-29
- 发明人: Sang Hyun Shin , Tae Hoon Kim , Cheol Ho Heo , Young Ki Lee , Ji Hyun Park , Ki Ho Seo
- 申请人: Sang Hyun Shin , Tae Hoon Kim , Cheol Ho Heo , Young Ki Lee , Ji Hyun Park , Ki Ho Seo
- 申请人地址: KR Gyunggi-do
- 专利权人: SAMSUNG ELECTRO-MECHANICS CO., LTD.
- 当前专利权人: SAMSUNG ELECTRO-MECHANICS CO., LTD.
- 当前专利权人地址: KR Gyunggi-do
- 优先权: KR1020100059441 20100623
- 主分类号: H01L33/48
- IPC分类号: H01L33/48 ; H01L33/64
摘要:
Disclosed is a heat-dissipating substrate, which includes a base substrate including a metal layer, an insulating layer formed on one surface of the metal layer, and a circuit layer formed on the insulating layer, a heat sink layer formed on the other surface of the metal layer, a connector for connecting the base substrate and the heat sink layer to each other, an opening formed in a direction of thickness of the base substrate and into which the connector is inserted, and an anodized layer formed on either or both of the other surface and a lateral surface of the metal layer, and in which the metal layer and the heat sink layer are insulated from each other by means of the anodized layer, thus preventing transfer of static electricity or voltage shock to the metal layer. A method of manufacturing the heat-dissipating substrate is also provided.
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