发明申请
US20120005637A9 SMART SELECTION AND/OR WEIGHTING OF PARAMETERS FOR LITHOGRAPHIC PROCESS SIMULATION 有权
智能选择和/或加权参数用于光刻过程模拟

SMART SELECTION AND/OR WEIGHTING OF PARAMETERS FOR LITHOGRAPHIC PROCESS SIMULATION
摘要:
The present invention generally relates to simulating a lithographic process, and more particularly to methods for smart selection and smart weighting when selecting parameters and/or kernels used in aerial image computation. According to one aspect, advantages in simulation throughput and/or accuracy can be achieved by selecting TCC kernels more intelligently, allowing highly accurate aerial images to be simulated using a relatively fewer number of TCC kernels than in the state of the art. In other words, the present invention allows for aerial images to be simulated with the same or better accuracy using much less simulation throughput than required in the prior art, all else being equal.
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