发明申请
- 专利标题: System and Method of Dosage Profile Control
- 专利标题(中): 剂量分布控制系统与方法
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申请号: US12831699申请日: 2010-07-07
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公开(公告)号: US20120009692A1公开(公告)日: 2012-01-12
- 发明人: Keung Hui , Chun-Lin Chang , Jong-I Mou
- 申请人: Keung Hui , Chun-Lin Chang , Jong-I Mou
- 申请人地址: TW Hsin-Chu
- 专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人地址: TW Hsin-Chu
- 主分类号: H01L21/66
- IPC分类号: H01L21/66 ; H01J37/317 ; H01J37/20
摘要:
A system and method for controlling a dosage profile is disclosed. An embodiment comprises separating a wafer into components of a grid array and assigning each of the grid components a desired dosage profile based upon a test to compensate for topology differences between different regions of the wafer. The desired dosages are decomposed into directional dosage components and the directional dosage components are translated into scanning velocities of the ion beam for an ion implanter. The velocities may be fed into an ion implanter to control the wafer-to-beam velocities and, thereby, control the implantation.
公开/授权文献
- US08309444B2 System and method of dosage profile control 公开/授权日:2012-11-13