发明申请
- 专利标题: ALIGNMENT OF LIGHT SOURCE FOCUS
- 专利标题(中): 光源对焦
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申请号: US12841728申请日: 2010-07-22
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公开(公告)号: US20120019826A1公开(公告)日: 2012-01-26
- 发明人: Matthew R. Graham , William N. Partlo , Steven Chang , Robert A. Bergstedt
- 申请人: Matthew R. Graham , William N. Partlo , Steven Chang , Robert A. Bergstedt
- 申请人地址: US CA San Diego
- 专利权人: CYMER, INC.
- 当前专利权人: CYMER, INC.
- 当前专利权人地址: US CA San Diego
- 主分类号: G01B11/26
- IPC分类号: G01B11/26
摘要:
An extreme ultraviolet light system includes a steering system that steers and focuses an amplified light beam traveling along a propagation direction to a focal plane near a target location within an extreme ultraviolet light chamber, a detection system including at least one detector positioned to detect an image of a laser beam reflected from at least a portion of a target material within the chamber, a wavefront modification system in the path of the reflected laser beam and between the target location and the detection system, and a controller. The wavefront modification system is configured to modify the wavefront of the reflected laser beam as a function of a target focal plane position along the propagation direction. The controller includes logic for adjusting a location of the focal plane of the amplified light beam relative to the target material based on the detected image of the reflected laser beam.
公开/授权文献
- US08648999B2 Alignment of light source focus 公开/授权日:2014-02-11
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