- 专利标题： RETICLE CHUCK CLEANER
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申请号： US13192694申请日： 2011-07-28
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公开(公告)号： US20120024318A1公开(公告)日： 2012-02-02
- 发明人: Masamitsu ITOH , Katsuya Okumura , Taro Inada , Jun Watanabe
- 申请人： Masamitsu ITOH , Katsuya Okumura , Taro Inada , Jun Watanabe
- 优先权： JP2010-169691 20100728
- 主分类号： B08B7/00
- IPC分类号： B08B7/00 ; B05D5/06 ; B05D5/12 ; B05D5/10
摘要：
According to one embodiment, a reticle chuck cleaner for cleaning a reticle chuck of an EUV exposure apparatus includes a substrate having a shape to be carried to the reticle chuck of the EUV exposure apparatus, and an adhesive formed on one of the main surfaces of the substrate.
公开/授权文献
- US09034467B2 Reticle chuck cleaner 公开/授权日：2015-05-19
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