Invention Application
US20120028196A1 METHOD OF FORMING PATTERN AND ORGANIC PROCESSING LIQUID FOR USE IN THE METHOD
审中-公开
方法中形成图案和有机加工液体的方法
- Patent Title: METHOD OF FORMING PATTERN AND ORGANIC PROCESSING LIQUID FOR USE IN THE METHOD
- Patent Title (中): 方法中形成图案和有机加工液体的方法
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Application No.: US13192188Application Date: 2011-07-27
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Publication No.: US20120028196A1Publication Date: 2012-02-02
- Inventor: Sou KAMIMURA , Kaoru IWATO , Yuichiro ENOMOTO , Shohei KATAOKA , Keita KATO , Shoichi SAITOH
- Applicant: Sou KAMIMURA , Kaoru IWATO , Yuichiro ENOMOTO , Shohei KATAOKA , Keita KATO , Shoichi SAITOH
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM CORPORATION
- Current Assignee: FUJIFILM CORPORATION
- Current Assignee Address: JP Tokyo
- Priority: JP2010-169595 20100728
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F7/26 ; G03F7/32
Abstract:
An embodiment of the method of forming a pattern, comprises (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, and (c) processing the exposed film with an organic processing liquid, wherein the processing liquid contains an organic solvent whose normal boiling point is 175° C. or higher, the organic solvent being contained in the processing liquid in a content of less than 30 mass %.
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