发明申请
- 专利标题: THERMAL MANAGEMENT OF FILM DEPOSITION PROCESSES
- 专利标题(中): 薄膜沉积工艺的热管理
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申请号: US12860619申请日: 2010-08-20
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公开(公告)号: US20120040485A1公开(公告)日: 2012-02-16
- 发明人: Sven Schramm , Susanne Schläfer
- 申请人: Sven Schramm , Susanne Schläfer
- 优先权: EP10172965.5 20100816
- 主分类号: H01L31/18
- IPC分类号: H01L31/18 ; C23C14/24 ; C23C14/00
摘要:
Thermal management of film deposition processes. In one aspect, a deposition system includes a vacuum chamber defining an evacuated interior volume, a deposition source disposed within the interior volume, a substrate holder disposed within the interior volume and arranged to hold a substrate with a first surface of the substrate facing the deposition source and a second surface of the substrate disposed facing away from the deposition source, and a heat sink disposed to have a first side of the heat sink in radiative thermal contact with the second surface of the substrate held by the substrate holder, the first side of the heat sink comprising a collection of features having a longitudinal dimension that is four or more times larger than a lateral dimension between the features, the features thereby dimensioned and aligned to reflect, multiple times in succession, radiative thermal emissions of the second surface of the substrate.
公开/授权文献
- US08709158B2 Thermal management of film deposition processes 公开/授权日:2014-04-29