发明申请
- 专利标题: RADIATION-SENSITIVE RESIN COMPOSITION AND COMPOUND
- 专利标题(中): 辐射敏感性树脂组合物和化合物
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申请号: US13288963申请日: 2011-11-04
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公开(公告)号: US20120045719A1公开(公告)日: 2012-02-23
- 发明人: Ken Maruyama , Kota Nishino , Kazuki Kasahara , Hirokazu Sakakibara
- 申请人: Ken Maruyama , Kota Nishino , Kazuki Kasahara , Hirokazu Sakakibara
- 申请人地址: JP Tokyo
- 专利权人: JSR Corporation
- 当前专利权人: JSR Corporation
- 当前专利权人地址: JP Tokyo
- 优先权: JP2009-119960 20090518
- 主分类号: G03F7/039
- IPC分类号: G03F7/039 ; C07C65/05
摘要:
A radiation-sensitive resin composition includes an acid-dissociable group-containing resin, and a compound shown by the following general formula (1). wherein Z− represents a monovalent anion shown by a general formula (2), M+ represents a monovalent onium cation, R1 represents a linear or branched alkyl group having 1 to 12 carbon atoms substituted or unsubstantiated with a fluorine atom, or a linear or branched alkoxy group having 1 to 12 carbon atoms, and n is 1 or 2.
公开/授权文献
- US08968980B2 Radiation-sensitive resin composition and compound 公开/授权日:2015-03-03
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