Invention Application
- Patent Title: ELECTRODEPOSITION OF THIN-FILM CELLS CONTAINING NON-TOXIC ELEMENTS
- Patent Title (中): 含有非毒性元素的薄膜电池的电沉积
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Application No.: US13222266Application Date: 2011-08-31
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Publication No.: US20120048378A1Publication Date: 2012-03-01
- Inventor: Hariklia Deligianni , Lian Guo , Raman Vaidyanathan
- Applicant: Hariklia Deligianni , Lian Guo , Raman Vaidyanathan
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Main IPC: C25D5/10
- IPC: C25D5/10 ; H01L31/0272 ; H01L31/02

Abstract:
A structure and method of making a thin-film solar cell. A thin-film solar cell includes a substrate, absorber layer and a buffer layer. The absorber layer is deposited by a single-step bulk electrochemical process, or a multi-layer electrochemical process. The buffer layer is deposited by an electrochemical deposition process such as a multi-layer deposition or an atomic layer deposition. The absorber and buffer layers are non-toxic materials which can include sulfur incorporated during the deposition process or incorporated after deposition by an anneal step.
Public/Granted literature
- US09085829B2 Electrodeposition of thin-film cells containing non-toxic elements Public/Granted day:2015-07-21
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