发明申请
- 专利标题: METHOD OF MANUFACTURING MAGNETORESISTIVE ELEMENT
- 专利标题(中): 制造磁性元件的方法
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申请号: US13186389申请日: 2011-07-19
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公开(公告)号: US20120050920A1公开(公告)日: 2012-03-01
- 发明人: Akihiko Takeo , Yoshihiko Fuji , Hiromi Yuasa , Michiko Hara , Shuichi Murakami , Hideaki Fukuzawa
- 申请人: Akihiko Takeo , Yoshihiko Fuji , Hiromi Yuasa , Michiko Hara , Shuichi Murakami , Hideaki Fukuzawa
- 申请人地址: JP Tokyo
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JP Tokyo
- 优先权: JP2010-196049 20100901
- 主分类号: H01F1/04
- IPC分类号: H01F1/04 ; G11B5/48
摘要:
According to one embodiment, a method of manufacturing a magnetoresistive element includes a layered structure and a pair of electrodes, the layered structure including a cap layer, a magnetization pinned layer, a magnetization free layer, a spacer layer and a functional layer provided in the magnetization pinned layer, between the magnetization pinned layer and the spacer layer, between the spacer layer and the magnetization free layer, in the magnetization free layer, or between the magnetization free layer and the cap layer and including an oxide, the method including forming a film including a base material of the functional layer, performing an oxidation treatment on the film using a gas containing oxygen in a form of at least one selected from the group consisting of molecule, ion, plasma and radical, and performing a reduction treatment using a reducing gas on the film after the oxidation treatment.
公开/授权文献
- US08685491B2 Method of manufacturing magnetoresistive element 公开/授权日:2014-04-01
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