摘要:
An example magneto-resistance effect element includes a fixed magnetization layer of which a magnetization is substantially fixed in one direction; a free magnetization layer of which a magnetization is rotated in accordance with an external magnetic field and which is formed opposite to the fixed magnetization layer; and a spacer layer including a current confining layer with an insulating layer and a conductor to pass a current through the insulating layer in a thickness direction thereof and which is located between the fixed magnetization layer and the free magnetization layer. A thin film layer is located on a side opposite to the spacer layer relative to the free magnetization layer and a functional layer containing at least one element selected from the group consisting of Si, Mg, B, Al is formed in or on at least one of the fixed magnetization layer, the free magnetization layer and the thin film layer.
摘要:
A magnetoresistive element includes a first electrode, a second electrode, a first magnetic layer, a second magnetic layer, a spacer layer, an oxide layer, and a metal layer. The oxide layer is provided between the first electrode and the first magnetic layer, or within the first magnetic layer, or between the first magnetic layer and the spacer layer, or within the spacer layer, or between the spacer layer and the second magnetic layer, or within the second magnetic layer, or between the second magnetic layer and the second electrode. The oxide layer includes at least one element of Zn, In, Sn, and Cd, and at least one element of Fe, Co, and Ni. The metal layer includes at least one element of Zn, In, Sn, and Cd by not less than 5 at % and not more than 80 at %, and at least one element of Fe, Co, and Ni.
摘要:
According to one embodiment, a method of manufacturing a magnetoresistive element includes a layered structure and a pair of electrodes, the layered structure including a cap layer, a magnetization pinned layer, a magnetization free layer, a spacer layer and a functional layer provided in the magnetization pinned layer, between the magnetization pinned layer and the spacer layer, between the spacer layer and the magnetization free layer, in the magnetization free layer, or between the magnetization free layer and the cap layer and including an oxide, the method including forming a film including a base material of the functional layer, performing an oxidation treatment on the film using a gas containing oxygen in a form of at least one selected from the group consisting of molecule, ion, plasma and radical, and performing a reduction treatment using a reducing gas on the film after the oxidation treatment.
摘要:
In a yoke type reproducing magnetic head, a magnetoresistance effect film can be arranged in the vicinity of a medium facing surface, so that sensitivity is improved. The yoke type reproducing magnetic head comprises: a pair of magnetic yokes which face each other via a magnetic gap, at least one of the pair of magnetic yokes extending from a medium facing surface to a position retracted from the medium facing surface; a magnetoresistance effect film which has a curved portion protruding toward the medium facing surface in the magnetic gap and which is magnetically connected to the magnetic yokes; and an electrode which is electrically connected to the magnetoresistance effect film.
摘要:
At least one magnetic pole out of a pair of magnetic poles is provided with a T-shaped magnetic pole having a magnetic pole chip at the position contacting with a magnetic gap and an auxiliary magnetic pole which is wider than thereof. The proximity of an air bearing surface of the T-shaped magnetic pole is composed of a laminated film containing a magnetic material layer with a high saturated magnetic flux density which composes the magnetic pole chip and a portion of the auxiliary magnetic pole and a magnetic material layer with a low saturated magnetic flux density which composes the remaining portion of the auxiliary magnetic pole. When the front portion of the magnetic pole with the track width of 1.8 .mu.m or less is composed of a laminated film containing a magnetic material layer having a high saturated magnetic flux density and a magnetic material layer having a low saturated magnetic flux density, the thickness of the magnetic material layer having the high saturated magnetic flux density is 0.5 .mu.m or more. According to the above described magnetic pole, the magnetic saturation near the tip portion of the magnetic pole is controlled, so that preferable magnetic field strength and magnetic field gradient can be attained when the track width is narrowed.
摘要:
The present invention provides a magnetoresistive sensor comprising a magnetoresistive film (MR film) having a magnetic field response portion; a pair of leads on the MR film to supply sensing current to the MR film; and upper and lower (first and second) magnetic shield layers arranged so as to sandwich the MR film through a magnetic gap film, respectively. The pair of lead layers is deposited on the side of the magnetic field response portion, i.e., a portion of the MR film between the pair of the leads is the magnetic field response portion. The lead layer respectively provides multi-stage tapered portions, comprising a first tapered portion having a steep angle with respect to the MR film surface, and a second tapered portion having a shallow angle with respect to the MR film surface and provided continuously with the first tapered portion.
摘要:
A strain sensor element comprises a laminated film which has a magnetic free layer, a spacer layer, and a magnetic reference layer. The free layer has a variable magnetization direction and a out-of-plane magnetization direction. The reference layer has a variable magnetization direction which is pinned more strongly than the magnetization of the free layer. The spacer layer provided between the free layer and the reference layer. A pair of electrodes is provided with a plane of the laminated film. A substrate is provided with either of the pair electrodes and can be strained. The rotation angle of the magnetization of the free layer is different from the rotation angle of the magnetization of the reference layer when the substrate is distorted. Electrical resistance is changed depending on the magnetization angle between the free layer and the reference layer, which allows the element to operate as a strain sensor.
摘要:
According to one embodiment, a pressure sensor includes a base, and a first sensor unit. The first sensor unit includes a first transducer thin film, a first strain sensing device and a second strain sensing device. The first strain sensing device includes a first magnetic layer, a second magnetic layer, and a first intermediate layer provided between the first and the second magnetic layers. The second strain sensing device is provided apart from the first strain sensing device on the first membrane surface and provided at a location different from a location of the barycenter, the second strain sensing device including a third magnetic layer, a fourth magnetic layer, and a second intermediate layer provided between the third and the fourth magnetic layers, the first and the second intermediate layers being nonmagnetic. The first and the second strain sensing devices, and the barycenter are in a straight line.
摘要:
According to one embodiment, a method for manufacturing a pressure sensing device includes preparing a sensor unit and a mounting substrate. The sensor unit includes: a membrane body; and an element unit provided on the membrane body. The element unit includes: a first electrode; a second electrode; and a first magnetic layer provided between the first electrode and the second electrode and having magnetization in a first direction. The mounting substrate includes: a base; a first electrode pad provided on the base; and a second electrode pad provided on the base and provided apart from the first electrode pad. The method further includes joining the first electrode pad to the first electrode while heated, and joining the second electrode pad to the second electrode while heated, with an external magnetic field along the first direction applied to the sensor unit.
摘要:
According to one embodiment, a strain and pressure sensing device includes a semiconductor circuit unit and a sensing unit. The semiconductor circuit unit includes a semiconductor substrate and a transistor. The transistor is provided on a semiconductor substrate. The sensing unit is provided on the semiconductor circuit unit, and has space and non-space portions. The non-space portion is juxtaposed with the space portion. The sensing unit further includes a movable beam, a strain sensing element unit, and first and second buried interconnects. The movable beam has fixed and movable portions, and includes first and second interconnect layers. The fixed portion is fixed to the non-space portion. The movable portion is separated from the transistor and extends from the fixed portion into the space portion. The strain sensing element unit is fixed to the movable portion. The first and second buried interconnects are provided in the non-space portion.