Invention Application
US20120051164A1 MEMORY CELL, METHODS OF MANUFACTURING MEMORY CELL, AND MEMORY DEVICE HAVING THE SAME 有权
存储单元,制造存储单元的方法和具有该存储单元的存储器件

MEMORY CELL, METHODS OF MANUFACTURING MEMORY CELL, AND MEMORY DEVICE HAVING THE SAME
Abstract:
A memory cell includes a selection transistor on a substrate and an antifuse on the substrate. The selection transistor includes a first gate connected to a read word line, a first gate insulation layer that insulates the first gate from the substrate, a first source region connected to a bit line, and a first drain region, an impurity concentration of the first drain region being lower than an impurity concentration of the first source region. The antifuse includes a first electrode connected to a program word line and a second electrode connected to the selection transistor.
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