Invention Application
US20120051164A1 MEMORY CELL, METHODS OF MANUFACTURING MEMORY CELL, AND MEMORY DEVICE HAVING THE SAME
有权
存储单元,制造存储单元的方法和具有该存储单元的存储器件
- Patent Title: MEMORY CELL, METHODS OF MANUFACTURING MEMORY CELL, AND MEMORY DEVICE HAVING THE SAME
- Patent Title (中): 存储单元,制造存储单元的方法和具有该存储单元的存储器件
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Application No.: US13219998Application Date: 2011-08-29
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Publication No.: US20120051164A1Publication Date: 2012-03-01
- Inventor: Jong-Pil Son , Seong-Jin Jang , Byung-Sik Moon , Doo-Young Kim , Ju-Seop Park
- Applicant: Jong-Pil Son , Seong-Jin Jang , Byung-Sik Moon , Doo-Young Kim , Ju-Seop Park
- Priority: KR10-2010-0083785 20100830
- Main IPC: G11C29/04
- IPC: G11C29/04 ; H01L21/336 ; G11C7/00 ; H01L27/088

Abstract:
A memory cell includes a selection transistor on a substrate and an antifuse on the substrate. The selection transistor includes a first gate connected to a read word line, a first gate insulation layer that insulates the first gate from the substrate, a first source region connected to a bit line, and a first drain region, an impurity concentration of the first drain region being lower than an impurity concentration of the first source region. The antifuse includes a first electrode connected to a program word line and a second electrode connected to the selection transistor.
Public/Granted literature
- US08547763B2 Memory cell, methods of manufacturing memory cell, and memory device having the same Public/Granted day:2013-10-01
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