发明申请
- 专利标题： GAS DISTRIBUTION SHOWERHEAD WITH HIGH EMISSIVITY SURFACE
- 专利标题（中）： 具有高功率表面的气体分配淋浴
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申请号： US13154060申请日： 2011-06-06
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公开(公告)号： US20120052216A1公开(公告)日： 2012-03-01
- 发明人: Hiroji Hanawa , Kyawwin Jason Maung , Hua Chung , Jie Cui , David Bour , Wei-Yung Hsu , Liang-Yuh Chen
- 申请人： Hiroji Hanawa , Kyawwin Jason Maung , Hua Chung , Jie Cui , David Bour , Wei-Yung Hsu , Liang-Yuh Chen
- 申请人地址： US CA Santa Clara
- 专利权人： APPLIED MATERIALS, INC.
- 当前专利权人： APPLIED MATERIALS, INC.
- 当前专利权人地址： US CA Santa Clara
- 主分类号： C23C16/48
- IPC分类号： C23C16/48
摘要：
Embodiments of the present invention provide methods and apparatus for surface coatings applied to process chamber components utilized in chemical vapor deposition processes. In one embodiment, the apparatus provides a showerhead apparatus comprising a body, a plurality of conduits extending through the body, each of the plurality of conduits having an opening extending to a processing surface of the body, and a coating disposed on the processing surface, the coating being about 50 microns to about 200 microns thick and comprising a coefficient of emissivity of about 0.8, an average surface roughness of about 180 micro-inches to about 220 micro-inches, and a porosity of about 15% or less.
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