发明申请
- 专利标题： NITROGEN-CONTAINING ORGANIC COMPOUND, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS
- 专利标题（中）： 含氮有机化合物，化学放大正电阻组合物和方法
-
申请号： US13217319申请日： 2011-08-25
-
公开(公告)号： US20120052441A1公开(公告)日： 2012-03-01
- 发明人: Masayoshi SAGEHASHI , Takeru Watanabe , Tomohiro Kobayashi
- 申请人： Masayoshi SAGEHASHI , Takeru Watanabe , Tomohiro Kobayashi
- 优先权： JP2010-189289 20100826
- 主分类号： G03F7/039
- IPC分类号： G03F7/039 ; C07D233/60 ; C07D235/08 ; G03F7/26 ; G03F7/38
摘要：
An aralkylcarbamate of imidazole base is effective as the quencher. In a chemically amplified positive resist composition comprising the carbamate, deprotection reaction of carbamate takes place by reacting with the acid generated upon exposure to high-energy radiation, whereby the composition changes its basicity before and after exposure, resulting in a pattern profile with advantages including high resolution, rectangular shape, and minimized dark-bright difference.
公开/授权文献
信息查询
IPC分类:
