发明申请
US20120052636A1 METHOD OF MANUFACTURING THIN FILM TRANSISTOR 有权
制造薄膜晶体管的方法

METHOD OF MANUFACTURING THIN FILM TRANSISTOR
摘要:
A thin film transistor includes a gate electrode, a first insulating layer on the gate electrode, a semiconductor layer on the gate electrode and separated from the gate electrode by the first insulating layer, the semiconductor layer including a channel region corresponding to the gate electrode, a source region, and a drain region, a hydrogen diffusion barrier layer on the semiconductor layer, the hydrogen diffusion barrier layer covering the channel region and exposing the source and drain regions, and a second insulation layer on the source and drain regions and on the hydrogen diffusion barrier layer, such that the hydrogen diffusion barrier layer is between the second insulation layer and the channel region.
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