发明申请
- 专利标题: METHOD OF MANUFACTURING THIN FILM TRANSISTOR
- 专利标题(中): 制造薄膜晶体管的方法
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申请号: US13289883申请日: 2011-11-04
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公开(公告)号: US20120052636A1公开(公告)日: 2012-03-01
- 发明人: Hyun-soo SHIN , Yeon-gon Mo , Jae-kyeong Jeong , Jin-seong Park , Hun-jung Lee , Jong-han Jeong
- 申请人: Hyun-soo SHIN , Yeon-gon Mo , Jae-kyeong Jeong , Jin-seong Park , Hun-jung Lee , Jong-han Jeong
- 申请人地址: KR Suwon-si
- 专利权人: SAMSUNG MOBILE DISPLAY CO., LTD.
- 当前专利权人: SAMSUNG MOBILE DISPLAY CO., LTD.
- 当前专利权人地址: KR Suwon-si
- 优先权: KR10-2007-0051994 20070529
- 主分类号: H01L21/336
- IPC分类号: H01L21/336
摘要:
A thin film transistor includes a gate electrode, a first insulating layer on the gate electrode, a semiconductor layer on the gate electrode and separated from the gate electrode by the first insulating layer, the semiconductor layer including a channel region corresponding to the gate electrode, a source region, and a drain region, a hydrogen diffusion barrier layer on the semiconductor layer, the hydrogen diffusion barrier layer covering the channel region and exposing the source and drain regions, and a second insulation layer on the source and drain regions and on the hydrogen diffusion barrier layer, such that the hydrogen diffusion barrier layer is between the second insulation layer and the channel region.
公开/授权文献
- US08871566B2 Method of manufacturing thin film transistor 公开/授权日:2014-10-28
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