发明申请
US20120061821A1 SEMICONDUCTOR CHIP WITH REDUNDANT THRU-SILICON-VIAS 有权
半导体芯片与冗余硅玻璃

SEMICONDUCTOR CHIP WITH REDUNDANT THRU-SILICON-VIAS
摘要:
A semiconductor chip with conductive vias and a method of manufacturing the same are disclosed. The method includes forming a first plurality of conductive vias in a layer of a first semiconductor chip. The first plurality of conductive vias includes first ends and second ends. A first conductor pad is formed in ohmic contact with the first ends of the first plurality of conductive vias.
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