发明申请
- 专利标题： IMAGING OPTICS AND PROJECTION EXPOSURE INSTALLATION FOR MICROLITHOGRAPHY WITH AN IMAGING OPTICS OF THIS TYPE
- 专利标题（中）： 使用这种类型的成像光学的成像光学和投影曝光安装
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申请号： US13235866申请日： 2011-09-19
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公开(公告)号： US20120069314A1公开(公告)日： 2012-03-22
- 发明人: Johannes Zellner , Aurelian Dodoc , Marco Pretorius , Christoph Menke , Wilhelm Ulrich , Hans-Juergen Mann
- 申请人： Johannes Zellner , Aurelian Dodoc , Marco Pretorius , Christoph Menke , Wilhelm Ulrich , Hans-Juergen Mann
- 申请人地址： DE Oberkochen
- 专利权人： CARL ZEISS SMT GMBH
- 当前专利权人： CARL ZEISS SMT GMBH
- 当前专利权人地址： DE Oberkochen
- 优先权： DE102009014953.8 20090330
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; G03B27/70 ; G02B17/06
摘要：
An imaging optics has a plurality of mirrors which image an object field in an object plane in an image field in an image plane. A pupil plane is arranged in the imaging beam path between the object field and the image field. A stop is arranged in the pupil plane. The pupil plane is tilted at an angle (α) with respect to the object plane, where α is greater than 0.1°. The imaging optics results allows for a manageable combination of small imaging errors, manageable production and good throughput.