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517 条记录 (耗时 0.031 秒)

    Reserving spatial light modulator sections to address field non-uniformities
    1.
    发明授权
    Reserving spatial light modulator sections to address field non-uniformities 有权

    公开(公告)号：US10705433B2

    公开(公告)日：2020-07-07

    申请号：US16597718

    申请日：2019-10-09

    申请人： Applied Materials, Inc.

    发明人： Joseph R. Johnson ,  Thomas L. Laidig ,  Christopher Dennis Bencher

    IPC分类号： G03F7/20 ,  G03B27/70

    摘要： Embodiments of the present disclosure generally provide improved photolithography systems and methods using a digital micromirror device (DMD). The DMD comprises columns and rows of micromirrors disposed opposite a substrate. Light beams reflect off the micromirrors onto the substrate, resulting in a patterned substrate. Certain subsets of the columns and rows of micromirrors may be positioned to the “off” position, such that they dump light, in order to correct for uniformity errors, i.e., features larger than desired, in the patterned substrate. Similarly, certain subsets of the columns and rows of micromirrors may be defaulted to the “off” position and selectively allowed to return to their programmed position in order to correct for uniformity errors, i.e., features smaller than desired, in the patterned substrate.

    Optical apparatus, and method of orienting a reflective element
    4.
    发明授权
    Optical apparatus, and method of orienting a reflective element 有权
    光学装置和反射元件的取向方法

    公开(公告)号：US08817232B2

    公开(公告)日：2014-08-26

    申请号：US13392032

    申请日：2010-04-09

    申请人： Edwin Johan Buis ,  Gosse Charles De Vries ,  Fidelus Adrianus Boon

    发明人： Edwin Johan Buis ,  Gosse Charles De Vries ,  Fidelus Adrianus Boon

    IPC分类号： G03B27/70 ,  G03F7/20

    CPC分类号： G03F7/70116 ,  G02B7/1821

    摘要： An optical apparatus has a moveable reflective element and associated actuator. The actuator includes a first magnet which is connected to the moveable reflective element such that movement of the first magnet will cause the moveable reflective element to move, and a second magnet which is connected to a motor such that operation of the motor will cause the second magnet to move. The second magnet is positioned relative to the first magnet such that moving the second magnet will cause the first magnet to move.

    摘要翻译： 光学装置具有可移动的反射元件和相关联的致动器。 致动器包括连接到可移动反射元件的第一磁体，使得第一磁体的移动将导致可移动的反射元件移动，以及连接到电动机的第二磁体，使得电动机的操作将导致第二磁体 磁铁移动。 第二磁体相对于第一磁体定位，使得移动第二磁体将使第一磁体移动。

    Scanning EUV interference imaging for extremely high resolution patterning
    5.
    发明授权
    Scanning EUV interference imaging for extremely high resolution patterning 有权
    扫描EUV干涉成像用于极高分辨率图案

    公开(公告)号：US08623588B2

    公开(公告)日：2014-01-07

    申请号：US12810994

    申请日：2008-12-23

    申请人： Harry Sewell

    发明人： Harry Sewell

    IPC分类号： G03B27/70

    CPC分类号： G03F7/70408 ,  G03F7/70266

    摘要： A system and method are provided for writing patterns onto substrates. First and second beams of extreme ultraviolet (EUV) radiation are produced. An exposure unit is used to project the first and second beams of EUV radiation onto a substrate. The first and second beams of radiation interfere with each other to expose a first set of parallel lines at an exposure field of the substrate.

    摘要翻译： 提供了将图案写入基板的系统和方法。 产生第一和第二束极紫外（EUV）辐射。 曝光单元用于将第一和第二束EUV辐射投射到基板上。 第一和第二辐射束彼此干涉以在衬底的曝光场处露出第一组平行线。

    Reflective optical element, projection system, and projection exposure apparatus
    7.
    发明授权
    Reflective optical element, projection system, and projection exposure apparatus 有权
    反光光学元件，投影系统和投影曝光装置

    公开(公告)号：US08610876B2

    公开(公告)日：2013-12-17

    申请号：US13046137

    申请日：2011-03-11

    申请人： Hans-Juergen Mann

    发明人： Hans-Juergen Mann

    IPC分类号： G03B27/70 ,  G03B27/68 ,  G03B27/52 ,  G03B27/42 ,  G03B27/54

    CPC分类号： G02B5/0891 ,  B82Y10/00 ,  G02B5/0875 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/064

    摘要： For the use in illumination systems and projection exposure apparatuses for UV or EUV lithography, a reflective optical element is provided for a operating wavelength in the ultraviolet to extreme ultraviolet wavelength ranges. The reflective optical element includes a substrate and a reflective surface on the substrate. The multilayer system has layers of at least two alternating materials having different real parts of the refractive index at the operating wavelength. Radiation in the operating wavelength of a certain incident angle bandwidth distribution can impinge on the reflective optical element. The reflective surface includes one or more first portions, in which the layers have alternating materials of a first period thickness. The reflective surface includes one or more additional portions, in which the layers of alternating materials have a first period thickness and at least one additional period thickness. The arrangement of the first and additional portions across the reflective surface is adapted to the incident angle bandwidth distribution. Furthermore, a projection system and a projection exposure apparatus including such a reflective optical element are suggested.

    摘要翻译： 对于在用于UV或EUV光刻的照明系统和投影曝光装置中的用途，提供反射光学元件用于在紫外至极紫外波长范围内的工作波长。 反射型光学元件包括衬底和衬底上的反射表面。 多层系统具有在工作波长处具有不同实际折射率部分的至少两种交替材料的层。 一定入射角度带宽分布的工作波长的辐射可以撞击在反射光学元件上。 反射表面包括一个或多个第一部分，其中层具有第一周期厚度的交替材料。 反射表面包括一个或多个附加部分，其中交替材料层具有第一周期厚度和至少一个附加周期厚度。 穿过反射表面的第一和附加部分的布置适于入射角带宽分布。 此外，提出了包括这种反射光学元件的投影系统和投影曝光装置。

    Imaging optical system and projection exposure system for microlithography
    8.
    发明授权
    Imaging optical system and projection exposure system for microlithography 有权
    用于微光刻的成像光学系统和投影曝光系统

    公开(公告)号：US08576376B2

    公开(公告)日：2013-11-05

    申请号：US12767521

    申请日：2010-04-26

    申请人： Hans-Juergen Mann

    发明人： Hans-Juergen Mann

    IPC分类号： G03B27/70 ,  G03B27/52

    CPC分类号： G03F7/702 ,  G02B17/02 ,  G02B17/0652 ,  G03F7/70058 ,  G03F7/70225 ,  G03F7/70233 ,  G03F7/70275

    摘要： An imaging optical system includes a plurality of mirrors that image an object field in an object plane into an image field in an image plane. At least one of the mirrors is obscured, and thus has a opening for imaging light to pass through. The fourth-last mirror in the light path before the image field is not obscured and provides, with an outer edge of the optically effective reflection surface thereof, a central shadowing in a pupil plane of the imaging optical system. The distance between the fourth-last mirror and the last mirror along the optical axis is at least 10% of the distance between the object field and the image field. An intermediate image, which is closest to the image plane, is arranged between the last mirror and the image plane. The imaging optical system can have a numerical aperture of 0.9. These measures, not all of which must be effected simultaneously, lead to an imaging optical system with improved imaging properties and/or reduced production costs.

    摘要翻译： 成像光学系统包括将物平面中的物场映像成像平面中的图像场的多个反射镜。 至少一个镜子被遮蔽，因此具有用于成像光通过的开口。 在图像场之前的光路中的第四后镜不被遮蔽，并且在其光学有效反射表面的外边缘处提供在成像光学系统的光瞳平面中的中心阴影。 沿着光轴的第四镜和最后镜之间的距离至少为物场和图像场之间的距离的10％。 最靠近图像平面的中间图像被布置在最后一个反射镜和图像平面之间。 成像光学系统的数值孔径可以为0.9。 这些措施，并不是所有这些都必须同时进行，导致成像光学系统具有改进的成像性能和/或降低生产成本。