发明申请
- 专利标题： CONDUCTIVE THICK METAL ELECTRODE FORMING METHOD
- 专利标题（中）： 导电厚度金属电极形成方法
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申请号： US12883936申请日： 2010-09-16
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公开(公告)号： US20120070570A1公开(公告)日： 2012-03-22
- 发明人: Woo Soo KIM , Ping LIU , Yiliang WU , Nan-Xing HU
- 申请人： Woo Soo KIM , Ping LIU , Yiliang WU , Nan-Xing HU
- 申请人地址： US CT Norwalk
- 专利权人： XEROX CORPORATION
- 当前专利权人： XEROX CORPORATION
- 当前专利权人地址： US CT Norwalk
- 主分类号： B05D3/02
- IPC分类号： B05D3/02 ; B05D5/00
摘要：
A method of forming conductive features on a substrate, the method includes, filling a flexible stamp with a metal nanoparticle composition, depositing the metal nanoparticle composition onto the substrate, and heating the deposited metal nanoparticle composition during or after the depositing to form the conductive features.
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