发明申请
- 专利标题： High Contrast Alignment Marks Through Multiple Stage Imprinting
- 专利标题（中）： 通过多级印刷的高对比度对准标记
-
申请号： US13245288申请日： 2011-09-26
-
公开(公告)号： US20120073462A1公开(公告)日： 2012-03-29
- 发明人: Joseph Michael Imhof , Kosta S. Selinidis , Dwayne L. LaBrake
- 申请人： Joseph Michael Imhof , Kosta S. Selinidis , Dwayne L. LaBrake
- 申请人地址： US TX Austin
- 专利权人： MOLECULAR IMPRINTS, INC.
- 当前专利权人： MOLECULAR IMPRINTS, INC.
- 当前专利权人地址： US TX Austin
- 主分类号： B41F1/18
- IPC分类号： B41F1/18
摘要：
Two-stage imprinting techniques capable of protecting fine patterned features of an imprint lithography template are herein described. In particular, such techniques may be used during fabrication of recessed high-contrast alignment marks for preventing deposited metal layers from coming into contact with fine features etched into the template.
公开/授权文献
信息查询
