- 专利标题: IMPRINT DEVICE AND MICROSTRUCTURE TRANSFER METHOD
-
申请号: US13312189申请日: 2011-12-06
-
公开(公告)号: US20120074615A1公开(公告)日: 2012-03-29
- 发明人: Takashi Ando , Susumu Komoriya , Masahiko Ogino , Akihiro Miyauchi
- 申请人: Takashi Ando , Susumu Komoriya , Masahiko Ogino , Akihiro Miyauchi
- 优先权: JP2006-187958 20060707
- 主分类号: B29C59/02
- IPC分类号: B29C59/02
摘要:
There is provided an imprint device for transferring a fine pattern to a material to form a patterned material. The device comprises a stamper having the fine pattern thereon, and a pressure distribution mechanism. The stamper is pressed against the material, and the pressure distribution mechanism provides a nonuniform pressure distribution in a patterned region of the patterned material, while the stamper is in contact with the material. There are provided an imprint device and a microstructure transfer method, by which it is possible to sufficiently spread a resin or other material for forming a pattern layer between a stamper and a patterned material with a lower pressure so as not to damage the stamper or the patterned material, and to form a pattern formation layer having the uniform thickness on the patterned material.
信息查询