Invention Application
- Patent Title: SEMICONDUCTOR LASER DEVICE
- Patent Title (中): 半导体激光器件
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Application No.: US13309120Application Date: 2011-12-01
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Publication No.: US20120076168A1Publication Date: 2012-03-29
- Inventor: Yuichiro OKUNUKI
- Applicant: Yuichiro OKUNUKI
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Electric Corporation
- Current Assignee: Mitsubishi Electric Corporation
- Current Assignee Address: JP Tokyo
- Priority: JP2009074678 20090325
- Main IPC: H01S5/026
- IPC: H01S5/026

Abstract:
A semiconductor laser according to the present invention comprises a λ/2 dielectric film (λ: in-medium wavelength of a dielectric film, for example, SiO2, Si3N4, Al2O3, and AlN) in contact with a facet of a resonator; and a first dielectric double layered film disposed on the dielectric film, which includes a first layer of a-Si and a second layer of a material having a refractive index lower than that of a-Si. The first layer has a thickness ¼ of an in-medium wavelength of a-Si, and the second layer has a thickness ¼ of an in-medium wavelength of the second layer. Therefore, it is possible to firmly stack the first dielectric double layered film and form a high reflectance film with high yield.
Public/Granted literature
- US08233514B2 Semiconductor laser device Public/Granted day:2012-07-31
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