发明申请
- 专利标题： Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition, Top Coat Composition And Pattern Formation Method
- 专利标题（中）： 含氟化合物，含氟聚合物化合物，抗蚀剂组合物，顶层组合物和图案形成方法
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申请号： US13375026申请日： 2010-05-20
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公开(公告)号： US20120077126A1公开(公告)日： 2012-03-29
- 发明人: Kazunori Mori , Yuji Hagiwara , Masashi Nagamori , Yoshimi Isono , Satoru Narizuka , Kazuhiko Maeda
- 申请人： Kazunori Mori , Yuji Hagiwara , Masashi Nagamori , Yoshimi Isono , Satoru Narizuka , Kazuhiko Maeda
- 优先权： JP2009-131919 20090601
- 国际申请： PCT/JP2010/058540 WO 20100520
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; G03F7/004 ; C07C69/593 ; C08K5/05 ; C07C69/54 ; C08F214/18 ; C09D127/12
摘要：
A fluorine-containing polymer of the present invention contains a repeating unit (a) of the general formula (2) and has a mass-average molecular weight of 1,000 to 1,000,000. This polymer is suitably used in a resist composition for pattern formation by high energy ray radiation of 300 nm or less wavelength or electron beam radiation or a top coat composition for liquid immersion lithography and is characterized as having high water repellency, notably high receding contact angle. In the formula, R1 represents a polymerizable double bond-containing group; R2 represents a fluorine atom or a fluorine-containing alkyl group; R8 represents a substituted or unsubstituted alkyl group or the like; and W1 represents a single bond, a substituted or unsubstituted methylene group or the like.
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