发明申请
- 专利标题: Substrate Depositing System and Method
- 专利标题(中): 基材沉积体系及方法
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申请号: US13186944申请日: 2011-07-20
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公开(公告)号: US20120094025A1公开(公告)日: 2012-04-19
- 发明人: Sun-Ho Kim , Cheol-Lae Roh , Suk-Won Jung , Hyun Choi , Min-Gyu Seo
- 申请人: Sun-Ho Kim , Cheol-Lae Roh , Suk-Won Jung , Hyun Choi , Min-Gyu Seo
- 申请人地址: KR Yongin-City
- 专利权人: SAMSUNG MOBILE DISPLAY CO., LTD.
- 当前专利权人: SAMSUNG MOBILE DISPLAY CO., LTD.
- 当前专利权人地址: KR Yongin-City
- 优先权: KR10-2010-0101411 20101018
- 主分类号: B05D5/00
- IPC分类号: B05D5/00 ; B05C11/00 ; B05C13/00
摘要:
A substrate depositing system comprises a substrate loading chamber for receiving a substrate, a substrate unloading chamber for withdrawing the substrate, at least one process chamber disposed between the substrate loading chamber and the substrate unloading chamber for processing the substrate, and a mask keeping chamber connected to one side of the process chamber(s). A substrate depositing method comprises inputting a substrate into a process chamber, transferring a mask to the process chamber from a mask keeping chamber connected to the process chamber, aligning the substrate and the mask, depositing a depositing material on the substrate while moving a deposition source in the process chamber, and withdrawing the substrate from the process chamber.
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