Invention Application
- Patent Title: MOLDING COMPOUND ON THE BASIS OF A COPOLYAMIDE CONTAINING TEREPHTHALIC ACID AND TRIMETHYLHEXAMETHYLENE DIAMINE UNITS
- Patent Title (中): 含有十五烷酸和三甲基乙酰胺二胺单体的共聚酰胺的成型化合物
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Application No.: US13377949Application Date: 2010-07-08
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Publication No.: US20120095161A1Publication Date: 2012-04-19
- Inventor: Andreas Pawlik , Martin Roos , Franz-Erich Baumann , Harald Haeger
- Applicant: Andreas Pawlik , Martin Roos , Franz-Erich Baumann , Harald Haeger
- Applicant Address: DE ESSEN
- Assignee: EVONIK DEGUSSA GmbH
- Current Assignee: EVONIK DEGUSSA GmbH
- Current Assignee Address: DE ESSEN
- Priority: DE102009027611.4 20090710
- International Application: PCT/EP10/59809 WO 20100708
- Main IPC: C08L77/06
- IPC: C08L77/06 ; C08G69/26

Abstract:
A molding compound, containing at least 30% by weight of a copolyamide, which is derived from the following monomers: a) 50 to 95 mole percent of the combination of a diamine, selected from the group consisting of 1,9-nonane diamine, 1,10-decane diamine, 1,11-undecane diamine and 1,12-dodecane diamine, and terephthalic acid, and b) 5 to 50 mole percent of the combination of a diamine, selected from the group consisting of 2,2,4-trimethylhexamethylene diamine, 2,4,4-trimethylhexamethylene diamine, and mixtures thereof, and terephthalic acid. The copolyamide is crystalline and has low water absorption.
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