发明申请
US20120100481A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
审中-公开
化学敏感性或辐射敏感性组合物和使用其的图案形成方法
- 专利标题: ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
- 专利标题(中): 化学敏感性或辐射敏感性组合物和使用其的图案形成方法
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申请号: US13381683申请日: 2010-07-28
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公开(公告)号: US20120100481A1公开(公告)日: 2012-04-26
- 发明人: Takayuki Ito , Tomotaka Tsuchimura , Takeshi Kawabata
- 申请人: Takayuki Ito , Tomotaka Tsuchimura , Takeshi Kawabata
- 申请人地址: JP Tokyo
- 专利权人: FUJIFILM CORPORATION
- 当前专利权人: FUJIFILM CORPORATION
- 当前专利权人地址: JP Tokyo
- 优先权: JP2009-180207 20090731; JP2009-204998 20090904
- 国际申请: PCT/JP2010/063131 WO 20100728
- 主分类号: G03F7/20
- IPC分类号: G03F7/20 ; G03F7/027 ; G03F7/004
摘要:
An actinic ray-sensitive or radiation-sensitive composition, including: (1) a low molecular compound having a molecular weight of 500 to 5,000 and containing (G) an acid-decomposable group; and (2) a compound capable of generating an acid of 305 Å3 or more in volume upon irradiation with an actinic ray or radiation, an actinic ray-sensitive or radiation-sensitive composition, including: a solvent; and (1A) a compound which is a low molecular compound having a molecular weight of 500 to 5,000 and containing (Z) one or more groups capable of decomposing upon irradiation with an actinic ray or radiation to produce an acid, (G) one or more acid-decomposable groups and (S) one or more dissolution auxiliary groups, wherein assuming that the number of the functional groups in one molecule of (Z), (G) and (S) is z, q and s, respectively, q/z≧2 and s/z≧2, and a pattern forming method using the composition are provided.