发明申请
- 专利标题: MEASUREMENT METHOD AND MEASUREMENT SYSTEM USING THE SAME
- 专利标题(中): 使用该方法的测量方法和测量系统
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申请号: US13182909申请日: 2011-07-14
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公开(公告)号: US20120101619A1公开(公告)日: 2012-04-26
- 发明人: Hyun-cheol Lee , In-kap Chang , Seung-hoon Tong
- 申请人: Hyun-cheol Lee , In-kap Chang , Seung-hoon Tong
- 申请人地址: KR Suwon-si
- 专利权人: SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人: SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人地址: KR Suwon-si
- 优先权: KR10-2010-0104245 20101025
- 主分类号: G06F19/00
- IPC分类号: G06F19/00
摘要:
Example embodiments relate to a measurement method of measuring lots with improved process efficiency. The measurement method may include calculating a measurement capability (indicating a degree to which members to be measured may be processed per unit time in a measurement device); allocating the measurement capability according to a processing device and a processing condition; and calculating a measurement ratio of the lots processed by the processing device and the processing condition.
公开/授权文献
- US08949064B2 Measurement method and measurement system using the same 公开/授权日:2015-02-03
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