Invention Application
US20120108485A1 MULTI-AGENT TYPE CLEANING KIT FOR SEMICONDUCTOR SUBSTRATES, CLEANING METHOD USING THE SAME AND METHOD OF PRODUCING SEMICONDUCTOR ELEMENT
有权
用于半导体基板的多元型清洁套件，使用其的清洁方法和生产半导体元件的方法
- Patent Title: MULTI-AGENT TYPE CLEANING KIT FOR SEMICONDUCTOR SUBSTRATES, CLEANING METHOD USING THE SAME AND METHOD OF PRODUCING SEMICONDUCTOR ELEMENT
- Patent Title (中): 用于半导体基板的多元型清洁套件，使用其的清洁方法和生产半导体元件的方法
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Application No.: US13281885Application Date: 2011-10-26
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Publication No.: US20120108485A1Publication Date: 2012-05-03
- Inventor: Tetsuya KAMIMURA
- Applicant: Tetsuya KAMIMURA
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM CORPORATION
- Current Assignee: FUJIFILM CORPORATION
- Current Assignee Address: JP Tokyo
- Priority: JP2010-241082 20101027
- Main IPC: G03F7/42
- IPC: G03F7/42
Abstract:
A multi-agent type cleaning kit for applying to semiconductor substrates, which contains a foaming agent having an alkylene carbonate and a carbonic acid salt, a foaming aid having an acidic compound, and an oxidizing agent; at least the foaming agent is mixed with the foaming aid upon using for the cleaning of a semiconductor substrate, in combination with the oxidizing agent.
Public/Granted literature
Information query
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