发明申请
US20120109607A1 Method, Program Product and Apparatus for Predicting Line Width Roughness and Resist Pattern Failure and the Use Thereof in a Lithography Simulation Process
审中-公开
方法，程序产品和装置，用于预测线宽粗糙度和抗蚀图案失效及其在平版印刷模拟过程中的应用
- 专利标题： Method, Program Product and Apparatus for Predicting Line Width Roughness and Resist Pattern Failure and the Use Thereof in a Lithography Simulation Process
- 专利标题（中）： 方法，程序产品和装置，用于预测线宽粗糙度和抗蚀图案失效及其在平版印刷模拟过程中的应用
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申请号： US13244191申请日： 2011-09-23
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公开(公告)号： US20120109607A1公开(公告)日： 2012-05-03
- 发明人: Steve Hansen
- 申请人： Steve Hansen
- 申请人地址： NL Veldhoven
- 专利权人： ASML Mask Tools B.V.
- 当前专利权人： ASML Mask Tools B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G06G7/48
- IPC分类号： G06G7/48
摘要：
A method of generating a model for simulating the imaging performance of an optical imaging system. The method includes the steps of defining the optical imaging system and a process to be utilized by the optical imaging system; defining a first model representing the imaging performance of the optical imaging system and the process, and calibrating the model, where the first model generates values corresponding to a latent image slope. The method further includes the step of defining a second model for estimating a line width roughness of a feature to be imaged, where the second model utilizes the latent image slope values to estimate the line width roughness.
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