发明申请
US20120115306A1 DEFLECTOR ARRAY, CHARGED PARTICLE BEAM DRAWING APPARATUS, DEVICE MANUFACTURING METHOD, AND DEFLECTOR ARRAY MANUFACTURING METHOD
审中-公开
偏转阵列，充电颗粒光束绘图装置，装置制造方法和偏光阵列制造方法
- 专利标题： DEFLECTOR ARRAY, CHARGED PARTICLE BEAM DRAWING APPARATUS, DEVICE MANUFACTURING METHOD, AND DEFLECTOR ARRAY MANUFACTURING METHOD
- 专利标题（中）： 偏转阵列，充电颗粒光束绘图装置，装置制造方法和偏光阵列制造方法
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申请号： US13289350申请日： 2011-11-04
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公开(公告)号： US20120115306A1公开(公告)日： 2012-05-10
- 发明人: Toru Yamazaki , Masamichi Kuwabara , Yoshihiro Hirata
- 申请人： Toru Yamazaki , Masamichi Kuwabara , Yoshihiro Hirata
- 申请人地址： JP Tokyo
- 专利权人： CANON KABUSHIKI KAISHA
- 当前专利权人： CANON KABUSHIKI KAISHA
- 当前专利权人地址： JP Tokyo
- 优先权： JP2010-251162 20101109
- 主分类号： H01L21/02
- IPC分类号： H01L21/02 ; G21K5/10 ; H01J37/305 ; H01J3/14
摘要：
A deflector array includes a first base substrate including a plurality of apertures formed thereon, and a plurality of deflector chips including a plurality of apertures formed thereon and a plurality of electrode pairs disposed at both sides of at least a part of the plurality of apertures. The plurality of deflector chips is fixed to the first base substrate in such a manner that the plurality of apertures of the deflector chips is arranged at positions corresponding to the plurality of apertures of the first base substrate.
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