发明申请
- 专利标题： EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS
- 专利标题（中）： 极光超光源光源装置
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申请号： US13293914申请日： 2011-11-10
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公开(公告)号： US20120119116A1公开(公告)日： 2012-05-17
- 发明人: Kouji KAKIZAKI , Shinji NAGAI , Tatsuya YANAGIDA
- 申请人： Kouji KAKIZAKI , Shinji NAGAI , Tatsuya YANAGIDA
- 申请人地址： JP Tokyo
- 专利权人： GIGAPHOTON INC.
- 当前专利权人： GIGAPHOTON INC.
- 当前专利权人地址： JP Tokyo
- 优先权： JP2009-146253 20090619; JP2010-138303 20100617
- 主分类号： G21K5/00
- IPC分类号： G21K5/00
摘要：
An extreme ultraviolet light source apparatus in which a target material is irradiated with a laser beam and turned into plasma and extreme ultraviolet light is emitted from the plasma may include: a chamber in which the extreme ultraviolet light is generated; an electromagnetic field generation unit for generating at least one of an electric field and a magnetic field inside the chamber; and a cleaning unit for charging and separating debris adhered to an optical element inside the chamber.
公开/授权文献
- US08530870B2 Extreme ultraviolet light source apparatus 公开/授权日：2013-09-10