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    EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS
    1.
    发明申请
    EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS 有权
    极光超光源光源装置

    公开(公告)号：US20120119116A1

    公开(公告)日：2012-05-17

    申请号：US13293914

    申请日：2011-11-10

    申请人： Kouji KAKIZAKI ,  Shinji NAGAI ,  Tatsuya YANAGIDA

    发明人： Kouji KAKIZAKI ,  Shinji NAGAI ,  Tatsuya YANAGIDA

    IPC分类号： G21K5/00

    CPC分类号： G21K5/00 ,  G03F7/70033 ,  G03F7/70916 ,  H05G2/005 ,  H05G2/008

    摘要： An extreme ultraviolet light source apparatus in which a target material is irradiated with a laser beam and turned into plasma and extreme ultraviolet light is emitted from the plasma may include: a chamber in which the extreme ultraviolet light is generated; an electromagnetic field generation unit for generating at least one of an electric field and a magnetic field inside the chamber; and a cleaning unit for charging and separating debris adhered to an optical element inside the chamber.

    摘要翻译： 从等离子体射出目标材料被照射激光并变成等离子体和极紫外光的极紫外光源装置可以包括：产生极紫外光的室; 电磁场产生单元，用于产生腔室内的电场和磁场中的至少一个; 以及用于对粘附到腔室内的光学元件的碎屑进行充填和分离的清洁单元。

    GAS DISCHARGE CHAMBER
    3.
    发明申请
    GAS DISCHARGE CHAMBER 有权
    气体放电室

    公开(公告)号：US20110158281A1

    公开(公告)日：2011-06-30

    申请号：US12899886

    申请日：2010-10-07

    申请人： Shinji NAGAI ,  Fumika YOSHIDA ,  Osamu WAKABAYASHI ,  Kouji KAKIZAKI

    发明人： Shinji NAGAI ,  Fumika YOSHIDA ,  Osamu WAKABAYASHI ,  Kouji KAKIZAKI

    IPC分类号： H01S3/034

    CPC分类号： H01S3/034 ,  G02B1/02 ,  G02B5/3091 ,  H01S3/0346 ,  H01S3/08054 ,  H01S3/0816 ,  H01S3/225 ,  H01S3/2251

    摘要： A gas discharge chamber that uses a calcium fluoride crystal which reduces a breakage due to mechanical stress (window holder and laser gas pressure), thermal stress from light absorption, and the like, increases the degree of linear polarization of output laser, and suppresses degradation due to strong ultraviolet (ArF, in particular) laser light irradiation. A first window (2) and a second window (3) of the gas discharge chamber have an incident plane and an emitting plane in parallel with a (111) crystal plane of their calcium fluoride crystal. With respect to an arrangement where laser light entering the calcium fluoride crystal passes through a plane including a axis and a axis of each of the first window (2) and the second window (3) as seen from inside the chamber (1), the first window (2) and the second window (3) are arranged in positions rotated in the same direction by the same angle about their axis.

    摘要翻译： 使用减少由于机械应力（窗口保持器和激光气体压力）的破裂的氟化钙晶体，来自光吸收等的热应力的气体放电室增加了输出激光器的线性极化的程度，并抑制了劣化 由于强紫外线（特别是ArF）激光照射。 气体放电室的第一窗口（2）和第二窗口（3）具有与其氟化钙晶体的（111）晶面平行的入射面和发射平面。 关于进入氟化钙晶体的激光通过包括第一窗口（2）和第二窗口（3）中的每一个的<111>轴和<001>轴的平面的布置，从内侧看 室（1），第一窗口（2）和第二窗口（3）被布置在围绕其<111>轴线沿相同方向旋转相同角度的位置。

    EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS
    7.
    发明申请
    EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS 有权
    极光超光源光源装置

    公开(公告)号：US20100051832A1

    公开(公告)日：2010-03-04

    申请号：US12543582

    申请日：2009-08-19

    申请人： Toshihiro NISHISAKA ,  Yukio WATANABE ,  Osamu WAKABAYASHI ,  Kouji KAKIZAKI ,  Michio SHINOZAKI

    发明人： Toshihiro NISHISAKA ,  Yukio WATANABE ,  Osamu WAKABAYASHI ,  Kouji KAKIZAKI ,  Michio SHINOZAKI

    IPC分类号： G21K5/04

    CPC分类号： G03F7/70033 ,  G03F7/70975 ,  H05G2/00 ,  H05G2/003 ,  H05G2/008

    摘要： An EUV light source apparatus by which detachment of a chamber or a part of the chamber, movement to a maintenance area, and highly accurate placement relative to projection optics can be performed easily for maintenance of the EUV light source apparatus. The EUV light source apparatus is an apparatus for generating plasma by applying a laser beam to a target material within a chamber and entering EUV light radiated from the plasma into projection optics of exposure equipment, and includes a positioning mechanism for positioning the chamber or a maintenance unit of the chamber in a predetermined location where an optical axis of the collected extreme ultraviolet light and an optical axis of the projection optics of the exposure equipment are aligned, and a movement mechanism for moving the chamber or the maintenance unit of the chamber between the predetermined location and a maintenance area.

    摘要翻译： EUV光源装置能够容易地进行EUV光源装置的维护，EUV光源装置能够容易地进行腔室或腔室的一部分的移动，到维护区域的移动以及相对于投影光学元件的高精度放置。 EUV光源装置是通过将激光束施加到室内的目标材料并且将从等离子体辐射的EUV光输入到曝光设备的投影光学器件中来产生等离子体的装置，并且包括用于定位腔室或维护的定位机构 在所述收集的极紫外光的光轴和所述曝光设备的投影光学元件的光轴对准的预定位置处的所述室的单元，以及用于将所述室或所述室的维护单元移动到所述室 预定位置和维护区域。

    CHAMBER APPARATUS AND METHOD OF MAINTAINING TARGET SUPPLY UNIT
    8.
    发明申请
    CHAMBER APPARATUS AND METHOD OF MAINTAINING TARGET SUPPLY UNIT 有权
    室内装置和维护目标供应单元的方法

    公开(公告)号：US20110310365A1

    公开(公告)日：2011-12-22

    申请号：US13051649

    申请日：2011-03-18

    申请人： Takayuki YABU ,  Kouji KAKIZAKI ,  Yukio WATANABE ,  Osamu WAKABAYASHI

    发明人： Takayuki YABU ,  Kouji KAKIZAKI ,  Yukio WATANABE ,  Osamu WAKABAYASHI

    IPC分类号： G03B27/52

    CPC分类号： G03F7/70033 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

    摘要： A chamber apparatus used with a laser apparatus may include: a chamber provided with at least one inlet for introducing thereinto a laser beam outputted from the laser apparatus; a target supply unit provided to the chamber for supplying a target material to a predetermined region in the chamber; a recovery control unit for instructing the target supply unit to execute recovery operation if a predetermined condition is met; a recovery unit for executing the recovery operation in response to the instruction from the recovery control unit; and a position measuring unit for measuring a position of the target material supplied from the target supply unit into the chamber.

    摘要翻译： 与激光装置一起使用的室装置可以包括：设置有至少一个入口的室，用于将从激光装置输出的激光束引入其中; 目标供给单元，其设置在所述室中，用于将目标材料供应到所述室中的预定区域; 恢复控制单元，用于在满足预定条件时指示目标供应单元执行恢复操作; 恢复单元，用于响应于来自恢复控制单元的指令执行恢复操作; 以及位置测量单元，用于测量从目标供应单元供应到室中的目标材料的位置。

    EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS
    9.
    发明申请
    EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS 有权
    极光超光源光源装置

    公开(公告)号：US20100140512A1

    公开(公告)日：2010-06-10

    申请号：US12603872

    申请日：2009-10-22

    申请人： Takashi SUGANUMA ,  Masato MORIYA ,  Tamotsu ABE ,  Kouji KAKIZAKI ,  Osamu WAKABAYASHI

    发明人： Takashi SUGANUMA ,  Masato MORIYA ,  Tamotsu ABE ,  Kouji KAKIZAKI ,  Osamu WAKABAYASHI

    IPC分类号： G21K5/00

    CPC分类号： G03F7/70891 ,  G03F7/70033 ,  G03F7/70141 ,  G03F7/70175 ,  G03F7/70191 ,  G03F7/70575 ,  G03F7/70591 ,  G03F7/7085 ,  H05G2/005

    摘要： An extreme ultraviolet (EUV) light source apparatus in which a location or posture shift of an EUV collector mirror can be detected. The apparatus includes: a chamber; a target supply mechanism for supplying a target material into the chamber; a driver laser for irradiating the target material with a laser beam to generate plasma; a collector mirror having a first focal point and a second focal point, for reflecting light, which is generated at the first focal point, toward the second focal point; a splitter optical element provided in an optical path of the light reflected by the collector mirror, for splitting a part of the light reflected by the collector mirror; and an image sensor provided in an optical path of the light split by the splitter optical element, for detecting a profile of the light split by the splitter optical element.

    摘要翻译： 可以检测EUV收集镜的位置或姿势偏移的极紫外（EUV）光源装置。 该装置包括：一个室; 用于将目标材料供应到所述室中的目标供给机构; 用于用激光束照射目标材料以产生等离子体的驱动器激光器; 收集器反射镜，具有第一焦点和第二焦点，用于将在第一焦点处产生的光朝向第二焦点反射; 分离器光学元件，设置在由集光镜反射的光的光路中，用于分离由集光镜反射的一部分光; 以及图像传感器，其设置在由分离光学元件分离的光的光路中，用于检测由分离光学元件分离的光的轮廓。