Invention Application
- Patent Title: ELECTROSTATIC ATTRACTING STRUCTURE AND FABRICATING METHOD THEREFOR
- Patent Title (中): 静电吸引结构及其制造方法
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Application No.: US13381868Application Date: 2010-06-29
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Publication No.: US20120120545A1Publication Date: 2012-05-17
- Inventor: Hiroshi Fujisawa , Megumu Kawae , Yoshiaki Tatsumi
- Applicant: Hiroshi Fujisawa , Megumu Kawae , Yoshiaki Tatsumi
- Priority: JP2009-157460 20090702
- International Application: PCT/JP10/61059 WO 20100629
- Main IPC: H02N13/00
- IPC: H02N13/00 ; H01L21/64

Abstract:
Provided are an electrostatic attracting structure which allows a strongly integrated structure to be maintained when used, and also allows the structure to be changed freely in configuration after the use, and a method of fabricating the same. The electrostatic attracting structure includes: a plurality of sheet members each having an electrode which is sandwiched between two dielectric materials; and at least one attraction power source, in which the plurality of sheet members are stacked, and by applying a voltage between the electrodes of facing sheet members, the facing sheet members are electrically attracted and fixed, when the electrostatic attracting structure is used, the dielectric material of any one of or both of outermost sheet members attracts the object to be attracted, and after the use, the stacked plurality of sheet members are made separable from one another by canceling the application of the voltage.
Information query