发明申请
- 专利标题: METHOD FOR PURIFYING CHLOROSILANES
- 专利标题(中): 纯化氯霉素的方法
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申请号: US13386926申请日: 2010-07-07
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公开(公告)号: US20120121493A1公开(公告)日: 2012-05-17
- 发明人: Naoki Nagai , Takaaki Shimizu , Katsuhiro Uehara , Tohru Kubota
- 申请人: Naoki Nagai , Takaaki Shimizu , Katsuhiro Uehara , Tohru Kubota
- 申请人地址: JP Chiyoda-ku
- 专利权人: Shin-Etsu Chemical Co., Ltd.
- 当前专利权人: Shin-Etsu Chemical Co., Ltd.
- 当前专利权人地址: JP Chiyoda-ku
- 优先权: JP2009187302 20090812
- 国际申请: PCT/JP2010/004441 WO 20100707
- 主分类号: C01B33/107
- IPC分类号: C01B33/107
摘要:
The present invention provides a method for obtaining high purity chlorosilanes from chlorosilanes containing boron impurities and phosphorus impurities. On the basis of the finding that solid by-product formation in the purification of chlorosilanes by adding an aromatic aldehyde results from a catalytic reaction by iron ions or rust-like iron, a Lewis base having a masking effect is added to chlorosilanes. Examples of the Lewis base include a divalent sulfur-containing compound and an alkoxysilane. The divalent sulfur-containing compound is preferably a compound represented by the formula: R—S—R′ (wherein R is a hydrocarbon group or a carbonyl group; and the sum of the carbon atoms in R and R′ is 7 or more), and the alkoxysilane is preferably a compound represented by the formula: RxSi(OR′)4-x (wherein R and R′ are each an alkyl group having 1 to 20 carbon atoms).
公开/授权文献
- US09193597B2 Method for purifying chlorosilanes 公开/授权日:2015-11-24
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