Invention Application
- Patent Title: METHOD FOR PRODUCING PHOTOVOLTAIC CELL
- Patent Title (中): 生产光伏电池的方法
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Application No.: US13298475Application Date: 2011-11-17
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Publication No.: US20120122263A1Publication Date: 2012-05-17
- Inventor: Youichi MACHII , Masato Yoshida , Takeshi Nojiri , Kaoru Okaniwa , Mitsunori Iwamuro , Shuuichirou Adachi , Akihiro Orita , Tetsuya Satou , Keiko Kizawa
- Applicant: Youichi MACHII , Masato Yoshida , Takeshi Nojiri , Kaoru Okaniwa , Mitsunori Iwamuro , Shuuichirou Adachi , Akihiro Orita , Tetsuya Satou , Keiko Kizawa
- Assignee: HITACHI CHEMICAL COMPANY, LTD.
- Current Assignee: HITACHI CHEMICAL COMPANY, LTD.
- Main IPC: H01L31/0232
- IPC: H01L31/0232

Abstract:
The method for producing a photovoltaic cell includes applying, on a partial region of one surface side of a semiconductor substrate, a first n-type diffusion layer forming composition including an n-type impurity-containing glass powder and a dispersion medium; applying, on at least a region other than the partial region on the surface of the semiconductor substrate, a second n-type diffusion layer forming composition which includes an n-type impurity-containing glass powder and a dispersion medium and in which a concentration of the n-type impurity is lower than that of the first n-type diffusion layer forming composition, where the first n-type diffusion layer forming composition is applied; heat-treating the semiconductor substrate on which the first n-type diffusion layer forming composition and the second n-type diffusion layer forming composition are applied to form an n-type diffusion layer; and forming an electrode on the partial region.
Public/Granted literature
- US08404599B2 Method for producing photovoltaic cell Public/Granted day:2013-03-26
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