Invention Application
US20120122292A1 Methods of Forming a Non-Volatile Resistive Oxide Memory Array
有权
形成非易失性电阻氧化物存储器阵列的方法
- Patent Title: Methods of Forming a Non-Volatile Resistive Oxide Memory Array
- Patent Title (中): 形成非易失性电阻氧化物存储器阵列的方法
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Application No.: US13354163Application Date: 2012-01-19
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Publication No.: US20120122292A1Publication Date: 2012-05-17
- Inventor: Gurtej Sandhu , John Smythe , Bhaskar Srinivasan
- Applicant: Gurtej Sandhu , John Smythe , Bhaskar Srinivasan
- Applicant Address: US ID Boise
- Assignee: MICRON TECHNOLOGY
- Current Assignee: MICRON TECHNOLOGY
- Current Assignee Address: US ID Boise
- Main IPC: H01L21/02
- IPC: H01L21/02

Abstract:
A method of forming a non-volatile resistive oxide memory array includes forming a plurality of one of conductive word lines or conductive bit lines over a substrate. Metal oxide-comprising material is formed over the plurality of said one of the word lines or bit lines. A series of elongated trenches is provided over the plurality of said one of the word lines or bit lines. A plurality of self-assembled block copolymer lines is formed within individual of the trenches in registered alignment with and between the trench sidewalls. A plurality of the other of conductive word lines or conductive bit lines is provided from said plurality of self-assembled block copolymer lines to form individually programmable junctions comprising said metal oxide-comprising material where the word lines and bit lines cross one another.
Public/Granted literature
- US08637113B2 Methods of forming a non-volatile resistive oxide memory array Public/Granted day:2014-01-28
Information query
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