发明申请
- 专利标题: PERPENDICULAR WRITE HEAD WITH WRAP AROUND SHIELD AND CONFORMAL SIDE GAP
- 专利标题(中): 平头写字头与封面和合适的边缝
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申请号: US12954458申请日: 2010-11-24
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公开(公告)号: US20120125885A1公开(公告)日: 2012-05-24
- 发明人: YINGJIAN CHEN , Shiwen Huang , Fenglin Liu , Kyusik Shin
- 申请人: YINGJIAN CHEN , Shiwen Huang , Fenglin Liu , Kyusik Shin
- 主分类号: G11B21/00
- IPC分类号: G11B21/00
摘要:
A perpendicular write head having a wrap around shield and a conformal side gap. In fabricating the write head, the leading edge shield may be chemical mechanical polished down to a level that is substantially even with a chemical mechanical polishing stop layer. Because the leading edge shield and the chemical mechanical polishing stop layer are used as RIE stop for trench RIE, a fully conformal side shield may be formed with a LTE/LES.
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