发明申请
US20120129108A1 BASE REACTIVE PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME
有权
基础反应光电发生器和包含它的光电子器件
- 专利标题: BASE REACTIVE PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME
- 专利标题(中): 基础反应光电发生器和包含它的光电子器件
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申请号: US13296949申请日: 2011-11-15
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公开(公告)号: US20120129108A1公开(公告)日: 2012-05-24
- 发明人: Emad AQAD , Mingqi LI , Cheng-Bai XU , Deyan WANG , Cong LIU , Joon Seok OH , Shintaro YAMADA
- 申请人: Emad AQAD , Mingqi LI , Cheng-Bai XU , Deyan WANG , Cong LIU , Joon Seok OH , Shintaro YAMADA
- 申请人地址: US MA Marlborough
- 专利权人: Rohm and Haas Electronic Materials LLC
- 当前专利权人: Rohm and Haas Electronic Materials LLC
- 当前专利权人地址: US MA Marlborough
- 主分类号: G03F7/20
- IPC分类号: G03F7/20 ; C08G75/00 ; C07C309/19
摘要:
This invention relates to new photoacid generator compounds and photoresist compositions that comprise such compounds. In particular, the invention relates to photoacid generator compounds that comprise base-cleavable groups.