Invention Application
- Patent Title: WIDE AREA STAMP FOR ANTIREFLECTIVE SURFACE
- Patent Title (中): 用于抗反射表面的广泛区域
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Application No.: US13407488Application Date: 2012-02-28
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Publication No.: US20120156321A1Publication Date: 2012-06-21
- Inventor: Kwangyeol LEE
- Applicant: Kwangyeol LEE
- Applicant Address: KR Seoul
- Assignee: KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION
- Current Assignee: KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION
- Current Assignee Address: KR Seoul
- Main IPC: B29C59/02
- IPC: B29C59/02 ; B82Y30/00

Abstract:
Nanoimprint molds for molding a surface of a material are provided. A nanoimprint mold includes a body with a molding surface that is formed by shaped nanopillars. The nanopillars may be formed on a substrate and shaped by performing at least a first partial oxidation of the nanopillars and then removing at least a portion of the oxidized material. Once shaped, a hard substance is deposited on the nanopillars to begin forming the molding surface of the nanoimprint mold. The deposition of a hard substance is followed by the deposition of carbon nanotube on the hard substance and then the removal of the substrate and nanopillars from the molding surface.
Public/Granted literature
- US08608468B2 Wide area stamp for antireflective surface Public/Granted day:2013-12-17
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