发明申请
US20120156595A1 COMPOSITIONS COMPRISING SUGAR COMPONENT AND PROCESSES FOR PHOTOLITHOGRAPHY
审中-公开
包含糖成分的组合物和光刻胶的方法
- 专利标题： COMPOSITIONS COMPRISING SUGAR COMPONENT AND PROCESSES FOR PHOTOLITHOGRAPHY
- 专利标题（中）： 包含糖成分的组合物和光刻胶的方法
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申请号： US13297261申请日： 2011-11-15
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公开(公告)号： US20120156595A1公开(公告)日： 2012-06-21
- 发明人: Joon-Seok OH , Deyan WANG , Cong LIU , Mingqi LI , Chunyi WU , Cheng-Bai XU
- 申请人： Joon-Seok OH , Deyan WANG , Cong LIU , Mingqi LI , Chunyi WU , Cheng-Bai XU
- 申请人地址： US MA Marlborough
- 专利权人： Rohm and Haas Electronic Materials LLC
- 当前专利权人： Rohm and Haas Electronic Materials LLC
- 当前专利权人地址： US MA Marlborough
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; G03F1/00 ; G03F7/004
摘要：
New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that have sugar substitution. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.
公开/授权文献
- US3076357A Spade drill blade 公开/授权日：1963-02-05