发明申请
US20120156622A1 Ortho-Nitrobenzyl Ester Compound and Positive Type Photosensitive Resin Composition Including the Same
有权
正 - 硝基苄酯类化合物及包含其的正型感光性树脂组合物
- 专利标题： Ortho-Nitrobenzyl Ester Compound and Positive Type Photosensitive Resin Composition Including the Same
- 专利标题（中）： 正 - 硝基苄酯类化合物及包含其的正型感光性树脂组合物
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申请号： US13239441申请日： 2011-09-22
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公开(公告)号： US20120156622A1公开(公告)日： 2012-06-21
- 发明人: Min-Kook CHUNG , Ji-Young JEONG , Hyun-Yong CHO , Yong-Sik YOO , Jeong-Woo LEE , Jong-Hwa LEE , Hwan-Sung CHEON , Soo-Young KIM , Young-Ho KIM , Jae-Hyun KIM , Su-Min PARK
- 申请人： Min-Kook CHUNG , Ji-Young JEONG , Hyun-Yong CHO , Yong-Sik YOO , Jeong-Woo LEE , Jong-Hwa LEE , Hwan-Sung CHEON , Soo-Young KIM , Young-Ho KIM , Jae-Hyun KIM , Su-Min PARK
- 申请人地址： KR Suwon-si KR Gumi-si
- 专利权人： SAMSUNG ELECTRONICS CO., LTD.,CHEIL INDUSTRIES INC.
- 当前专利权人： SAMSUNG ELECTRONICS CO., LTD.,CHEIL INDUSTRIES INC.
- 当前专利权人地址： KR Suwon-si KR Gumi-si
- 优先权： KR10-2010-0128278 20101215
- 主分类号： G03F7/075
- IPC分类号： G03F7/075 ; C07C69/94
摘要：
An ortho-nitrobenzyl ester compound including a compound represented by Chemical Formula 1, and a positive photosensitive resin composition including the same are provided.