发明申请
US20120164382A1 COMPOSITION FOR FORMING A SILICA LAYER, METHOD OF MANUFACTURING THE COMPOSITION, SILICA LAYER PREPARED USING THE COMPOSITION, AND METHOD OF MANUFACTURING THE SILICA LAYER
有权
用于形成二氧化硅层的组合物，制备组合物的方法，使用该组合物制备的二氧化硅层和制备二氧化硅层的方法
- 专利标题： COMPOSITION FOR FORMING A SILICA LAYER, METHOD OF MANUFACTURING THE COMPOSITION, SILICA LAYER PREPARED USING THE COMPOSITION, AND METHOD OF MANUFACTURING THE SILICA LAYER
- 专利标题（中）： 用于形成二氧化硅层的组合物，制备组合物的方法，使用该组合物制备的二氧化硅层和制备二氧化硅层的方法
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申请号： US13330856申请日： 2011-12-20
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公开(公告)号： US20120164382A1公开(公告)日： 2012-06-28
- 发明人: Hui-Chan YUN , Taek-Soo Kwak , Bong-Hwan Kim , Jin-Hee Bae , Jung-Kang Oh , Sang-Hak Lim , Dong-Il Han , Sang-Kyun Kim , Jin-Wook Lee
- 申请人： Hui-Chan YUN , Taek-Soo Kwak , Bong-Hwan Kim , Jin-Hee Bae , Jung-Kang Oh , Sang-Hak Lim , Dong-Il Han , Sang-Kyun Kim , Jin-Wook Lee
- 优先权： KR10-2010-0132734 20101222; KR10-2011-0107657 20111020
- 主分类号： C09D183/00
- IPC分类号： C09D183/00 ; B32B9/00 ; B05D5/12
摘要：
A composition for forming a silica layer, a method of manufacturing the composition, a silica layer prepared using the composition, and a method of manufacturing the silica layer, the composition including hydrogenated polysilazane, hydrogenated polysiloxazane, or a combination thereof, wherein a concentration of a sum of hydrogenated polysilazane and hydrogenated polysiloxazane having a weight average molecular weight, reduced to polystyrene, of greater than or equal to about 50,000 is about 0.1 wt % or less, based on a total amount of the hydrogenated polysilazane and hydrogenated polysiloxazane.
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