发明申请
- 专利标题: LASER ANNEALING METHOD AND APPARATUS
- 专利标题(中): 激光退火方法和装置
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申请号: US13418653申请日: 2012-03-13
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公开(公告)号: US20120168421A1公开(公告)日: 2012-07-05
- 发明人: Norihito KAWAGUCHI , Ryusuke KAWAKAMI , Kenichiro NISHIDA , Miyuki MASAKI , Masaru MORITA
- 申请人: Norihito KAWAGUCHI , Ryusuke KAWAKAMI , Kenichiro NISHIDA , Miyuki MASAKI , Masaru MORITA
- 申请人地址: JP Tokyo
- 专利权人: IHI CORPORATION
- 当前专利权人: IHI CORPORATION
- 当前专利权人地址: JP Tokyo
- 优先权: JP2008-000347 20080107
- 主分类号: H05B7/18
- IPC分类号: H05B7/18
摘要:
In the case of a lens array type homogenizer optical system, the incident angle and intensity of a laser beam 1 entering a large-sized lens (long-axis condenser lens 22) of a long-axis condensing optical system, which is provided on the rear side, are changed for every shot by performing laser irradiation while long-axis lens arrays 20a and 20b are reciprocated in a direction corresponding to a long axial direction of a linear beam (X-direction). Therefore, vertical stripes are significantly reduced. Further, the incident angle and intensity of a laser beam 1 entering a large-sized lens (projection lens 30) of a short-axis condensing optical system, which is provided on the rear side, are changed for every shot by performing laser irradiation while short-axis lens arrays 26a and 26b are reciprocated in a direction corresponding to a short axial direction of a linear beam (Y-direction). Therefore, horizontal stripes are significantly reduced.
公开/授权文献
- US08446924B2 Laser annealing method and apparatus 公开/授权日:2013-05-21
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