Invention Application
- Patent Title: POLYMERS, PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PHOTOLITHOGRAPHIC PATTERNS
- Patent Title (中): 聚合物，光电组合物和形成光刻图案的方法
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Application No.: US13341935Application Date: 2011-12-31
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Publication No.: US20120171617A1Publication Date: 2012-07-05
- Inventor: Young Cheol BAE , Thomas H. Peterson , Yi Liu , Jong Keun Park , Seung-Hyun Lee , Thomas Cardolaccia
- Applicant: Young Cheol BAE , Thomas H. Peterson , Yi Liu , Jong Keun Park , Seung-Hyun Lee , Thomas Cardolaccia
- Applicant Address: US MI Midland US MA Marlborough
- Assignee: Dow Global Technologies LLC,Rohm and Haas Electronic Matericals LLC
- Current Assignee: Dow Global Technologies LLC,Rohm and Haas Electronic Matericals LLC
- Current Assignee Address: US MI Midland US MA Marlborough
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F7/004 ; C08F224/00
Abstract:
Provided are polymers that include a unit comprising a particular acetal moiety and a unit comprising a lactone moiety. Also provided are photoresist compositions containing such a polymer, substrates coated with the photoresist compositions and methods of forming photolithographic patterns. The polymers, compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.
Public/Granted literature
- US08614050B2 Polymers, photoresist compositions and methods of forming photolithographic patterns Public/Granted day:2013-12-24
Information query
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