发明申请
- 专利标题: CLEANING OF A PROCESS CHAMBER
- 专利标题(中): 过程室的清洁
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申请号: US13386711申请日: 2010-05-28
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公开(公告)号: US20120180810A1公开(公告)日: 2012-07-19
- 发明人: Rudolf Beckmann , Michael Geisler , Harald Rost
- 申请人: Rudolf Beckmann , Michael Geisler , Harald Rost
- 申请人地址: DE Alzenau
- 专利权人: LEYBOLD OPTICS GMBH
- 当前专利权人: LEYBOLD OPTICS GMBH
- 当前专利权人地址: DE Alzenau
- 优先权: DE102009035045.4 20090726; DE102010008499.9 20100218
- 国际申请: PCT/EP2010/003247 WO 20100528
- 主分类号: B08B7/00
- IPC分类号: B08B7/00 ; B05C5/00
摘要:
A method for cleaning at least one component arranged in the inner region of a plasma process chamber using a cleaning gas including fluorine gas, where the process chamber has at least one electrode and counter-electrode for generating a plasma for plasma treatment, where the inner region is exposed to gaseous fluorine compounds with a partial pressure of greater than 5 mbar, where the process chamber has at least one electrode and counter-electrode for generating a plasma, and the fluorine gas is thermally activated by means of a temperature-regulating means, where the component to be cleaned has a temperature of