发明申请
US20120182537A1 SPECTRAL PURITY FILTER, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD
审中-公开
光谱滤光片，光刻设备和器件制造方法
- 专利标题： SPECTRAL PURITY FILTER, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD
- 专利标题（中）： 光谱滤光片，光刻设备和器件制造方法
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申请号： US13497735申请日： 2010-08-02
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公开(公告)号： US20120182537A1公开(公告)日： 2012-07-19
- 发明人: Andrei Mikhailovich Yakunin , Vadim Yevgenyevich Banine , Maarten Marinus Johannes Wilhelmus Van Herpen , Wouter Anthon Soer , Martin Jacobus Johan Jak
- 申请人： Andrei Mikhailovich Yakunin , Vadim Yevgenyevich Banine , Maarten Marinus Johannes Wilhelmus Van Herpen , Wouter Anthon Soer , Martin Jacobus Johan Jak
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 国际申请： PCT/EP2010/061203 WO 20100802
- 主分类号： G03B27/72
- IPC分类号： G03B27/72 ; G03B27/32 ; G02B5/20
摘要：
A spectral purity filter, in particular for use in a lithographic apparatus using EUV radiation for the projection beam, includes a plurality of apertures in a substrate. The apertures are defined by walls having side surfaces that are inclined to the normal to a front surface of the substrate.
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