发明申请
- 专利标题: CATOPTRIC OBJECTIVES AND SYSTEMS USING CATOPTRIC OBJECTIVES
- 专利标题(中): 使用目标目标的CATOPR目标和系统
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申请号: US13438428申请日: 2012-04-03
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公开(公告)号: US20120188525A1公开(公告)日: 2012-07-26
- 发明人: Hans-Juergen Mann , Wilhelm Ulrich , Marco Pretorius
- 申请人: Hans-Juergen Mann , Wilhelm Ulrich , Marco Pretorius
- 申请人地址: DE Oberkochen
- 专利权人: CARL ZEISS SMT GMBH
- 当前专利权人: CARL ZEISS SMT GMBH
- 当前专利权人地址: DE Oberkochen
- 主分类号: G03B27/70
- IPC分类号: G03B27/70 ; G03F7/20 ; G02B17/02
摘要:
In general, in a first aspect, the invention features a system that includes a microlithography projection optical system. The microlithography projection optical system includes a plurality of elements arranged so that during operation the plurality of elements image radiation at a wavelength λ from an object plane to an image plane. At least one of the elements is a reflective element that has a rotationally-asymmetric surface positioned in a path of the radiation. The rotationally-asymmetric surface deviates from a rotationally-symmetric reference surface by a distance of about λ or more at one or more locations of the rotationally-asymmetric surface.
公开/授权文献
- US09465300B2 Catoptric objectives and systems using catoptric objectives 公开/授权日:2016-10-11